Suspect allegedly leaked EUV process technology while employed at Samsung Electronics
Information related to core lithography process for advanced semiconductor production
Prosecutors applied charges under the Industrial Technology Protection Act
Indicted without detention after arrest warrant was rejected by court
A researcher at a prominent South Korean university's industry-academic cooperation foundation has been indicted on charges of leaking core technology related to the extreme ultraviolet (EUV) lithography process used in advanced semiconductor production — technology he allegedly took without authorization while employed at Samsung Electronics.
According to legal sources Tuesday, the Fifth Division for Serious Crime Indictment at the Seoul Central District Prosecution Office indicted the researcher, identified only as A, on Monday on charges of violating the Industrial Technology Protection Act. He was indicted without being placed in detention.
A is accused of unlawfully leaking confidential information about Samsung Electronics' EUV lithography process while employed at the company.
EUV uses extremely short-wavelength light to etch microscopic circuits onto silicon wafers, the base material for semiconductors. It is considered a core process in advanced chip production because of its ability to render circuits with greater precision.
As semiconductor circuits continue to shrink, the importance of EUV processes grows accordingly, making related technical information a critical asset that determines a chipmaker's competitive edge.
Prosecutors had earlier sought an arrest warrant for A, citing the significance of the leaked technology, but the court rejected the request.
Prosecutors then indicted A without detention.
The specific circumstances of the alleged leak and the scope of the information involved are expected to be examined during the trial.
sjy@heraldcorp.com
