- Enables precise measurement even under complex process conditions

- Aims to strengthen competitiveness of semiconductor and display industries

Korea Institute of Fusion Energy President Oh Young-kook (right) and Ascendia CEO Park Moon-soo pose for a photo after signing a technology licensing agreement for high-precision RF power measurement technology. [Korea Institute of Fusion Energy]
Korea Institute of Fusion Energy President Oh Young-kook (right) and Ascendia CEO Park Moon-soo pose for a photo after signing a technology licensing agreement for high-precision RF power measurement technology. [Korea Institute of Fusion Energy]

The Korea Institute of Fusion Energy signed a technology licensing agreement Tuesday with Ascendia Co. to transfer high-precision RF (radio frequency) power measurement technology for use in semiconductor and display plasma equipment.

As semiconductor and display manufacturing processes grow increasingly fine and sophisticated, the ability to accurately diagnose the condition of plasma equipment has become more critical.

Conventional sensors used on mass production lines measure power status based on voltage and current, limiting their ability to accurately gauge actual delivered power under complex plasma process conditions. The DiCoVI (Directional Coupled VI) sensor developed by the institute adds directional coupling technology to the conventional sensor approach, improving measurement accuracy.

The DiCoVI sensor can more precisely monitor RF power delivery while equipment is in operation, making it applicable to equipment condition monitoring and process diagnostics.

The technology grew out of two research initiatives: the Plasma Equipment Intelligent Convergence Research Center project, which the institute has carried out since 2020 under the National Research Council of Science and Technology's convergence research program, and the strategic research project "Semiconductor Equipment Development for Ultra-Fine Processes," launched in January.

The institute expects to extend its plasma measurement and diagnostics technology into the semiconductor and display equipment sector, supporting process diagnostics and equipment intelligence in industrial settings and contributing to stronger technological competitiveness in the semiconductor equipment field.

Ascendia, founded in 1990, has developed and manufactured key RF power components for semiconductor plasma processes, including high-frequency power supplies, RF matchers, filters and tuners. The company plans to integrate the DiCoVI sensor into its RF matchers to develop and commercialize a next-generation RF matcher with high-precision measurement capabilities.

"The plasma source technologies accumulated through fusion energy research and development can be applied broadly across advanced industries including semiconductors and displays," institute President Oh Young-kook said. "We will actively expand technological cooperation with companies to ensure that the institute's core technologies continue to reach industrial settings."


nbgkoo@heraldcorp.com